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11 May 04:53

Step-edge controlled fast growth of wafer-scale MoSe2 films by MOCVD

Abstract

Two-dimensional (2D) transition metal dichalcogenides (TMDCs), due to their unique physical properties, have a wide range of applications in the next generation of electronics, optoelectronics, and valleytronics. Large-scale preparation of high-quality TMDCs films is critical to realize these potential applications. Here we report a study on metal-organic chemical vapor deposition (MOCVD) growth of wafer-scale MoSe2 films guided by the crystalline step edges of miscut sapphire wafers. We established that the nucleation density and growth rate of MoSe2 films were positively correlated with the step-edge density and negatively with the growth temperature. At a certain temperature, the MoSe2 domains on the substrate with high step-edge density grow faster than that with low density. As a result, wafer-scale and continuous MoSe2 films can be formed in a short duration (30 min). The MoSe2 films are of high crystalline quality, as confirmed by systematic Raman and photoluminescence (PL) measurements. The results provide an important methodology for the rapid growth of wafer-scale TMDCs, which may promote the application of 2D semiconductors.

11 May 04:36

Nanoscale friction and wear behavior of a CVD-grown aged WS2 monolayer: the role of wrinkles and surface chemistry

Nanoscale, 2023, 15,10079-10088
DOI: 10.1039/D3NR01261A, Paper
Himanshu Rai, Deepa Thakur, Aayush Gadal, Zhijiang Ye, Viswanath Balakrishnan, Nitya Nand Gosvami
Herein, we report the role of wrinkles and surface chemistry on the nanoscale friction and wear behavior of a CVD-grown aged WS2 monolayer.
The content of this RSS Feed (c) The Royal Society of Chemistry
10 May 06:01

Post-annealing optimization of the heteroepitaxial La-doped SrSnO3 integrated on silicon via ALD

Nanoscale, 2023, 15,9432-9439
DOI: 10.1039/D2NR06861C, Paper
Yu Zhang, Shen Hu, Pei-Yu Chen, Jiyuan Zhu, Bojia Chen, Rongxu Bai, Hao Zhu, Lin Chen, David W. Zhang, Jack C. Lee, Qingqing Sun, John G. Ekerdt, Li Ji
This study demonstrated the successful epitaxy of La-SrSnO3/BaTiO3 on SrTiO3-buffered Si (001) with ALD-deposited La-SrSnO3 and explored the optimization of post-annealing to enhance the capacitance properties of heterostructure.
The content of this RSS Feed (c) The Royal Society of Chemistry
10 May 05:59

Observation of Electric Hysteresis, Polarization Oscillation, and Pyroelectricity in Nonferroelectric $p\text{−}n$ Heterojunctions

by Yucheng Jiang, Xinglong Ma, Lin Wang, Jinlei Zhang, Zhichao Wang, Run Zhao, Guozhen Liu, Yang Li, Cheng Zhang, Chunlan Ma, Yaping Qi, Lin Wu, and Ju Gao

Author(s): Yucheng Jiang, Xinglong Ma, Lin Wang, Jinlei Zhang, Zhichao Wang, Run Zhao, Guozhen Liu, Yang Li, Cheng Zhang, Chunlan Ma, Yaping Qi, Lin Wu, and Ju Gao

The switchable electric polarization is usually achieved in ferroelectric materials with noncentrosymmetric structures, which opens exciting opportunities for information storage and neuromorphic computing. In another polar system of p−n junction, there exists the electric polarization at the interf…


[Phys. Rev. Lett. 130, 196801] Published Tue May 09, 2023

10 May 05:58

[ASAP] α‑In2Se3 Nanostructure-Based Photodetectors for Tunable and Broadband Response

by Wei Zhang, Qing Su, Bowen Zhang, Junkai Peng, and Yubao Li

TOC Graphic

ACS Applied Nano Materials
DOI: 10.1021/acsanm.3c01190
10 May 05:58

[ASAP] Mechanical Properties of 2D LiInP2Se6: Implication for Semiconductor Applications

by Doyun Kim, Eric K. Qian, Daniel G. Chica, Yu-Hsiang Chiang, Mercouri G. Kanatzidis, and Qing Tu

TOC Graphic

ACS Applied Nano Materials
DOI: 10.1021/acsanm.3c00455
10 May 05:57

[ASAP] General Approach for Two-Dimensional Rare-Earth Oxyhalides with High Gate Dielectric Performance

by Biao Zhang, Yuchen Zhu, Yi Zeng, Zijing Zhao, Xiaoxiao Huang, Daping Qiu, Zhi Fang, Jingjing Wang, Junjie Xu, Rongming Wang, Song Gao, and Yanglong Hou

TOC Graphic

Journal of the American Chemical Society
DOI: 10.1021/jacs.3c00401
09 May 10:47

Triggering Pt Active Sites in Basal Plane of Van der Waals PtTe2 Materials by Amorphization Engineering for Hydrogen Evolution

by Wen Zhao, Congcong Cui, Yongheng Xu, Qiyuan Liu, Yang Zhang, Zihan Zhang, Shenci Lu, Ziqiang Rong, Xinzhe Li, Yiyun Fang, Wei Huang
Triggering Pt Active Sites in Basal Plane of Van der Waals PtTe2 Materials by Amorphization Engineering for Hydrogen Evolution

An efficient amorphous strategy is developed to trigger the reconfiguration of interlayer Pt atoms in 2D PtTe2 materials and tailor the electronic properties of Pt active sites via the orbital hybridization with oxygen dopants. O ur findings provide an efficient strategy for designing amorphous catalysts whose number of active sites and adsorption strength to reaction intermediates are significantly increased and optimized.


Abstract

Exposing active sites and optimizing their binding strength to reaction intermediates are two essential strategies to significantly improve the catalytic performance of 2D materials. However, pursuing an efficient way to achieve these goals simultaneously remains a considerable challenge. Here, using 2D PtTe2 van der Waals material with a well-defined crystal structure and atomically thin thickness as a model catalyst, it is observed that a moderate calcination strategy can promote the structural transformation of 2D crystal PtTe2 nanosheets (c-PtTe2 NSs) into oxygen-doped 2D amorphous PtTe2 NSs (a-PtTe2 NSs). The experimental and theoretical investigations cooperatively reveal that oxygen dopants can break the inherent Pt-Te covalent bond in c-PtTe2 NSs, thereby triggering the reconfiguration of interlayer Pt atoms and exposing them thoroughly. Meanwhile, the structural transformation can effectively tailor the electronic properties (e.g., the density of state near the Fermi level, d-band center, and conductivity) of Pt active sites via the hybridization of Pt 5d orbitals and O 2p orbitals. As a result, a-PtTe2 NSs with large amounts of exposed Pt active sites and optimized binding strength to hydrogen intermediates exhibit excellent activity and stability in hydrogen evolution reaction.

09 May 10:42

Modulating the Function of GeAs/ReS2 van der Waals Heterojunction with its Potential Application for Short‐Wave Infrared and Polarization‐Sensitive Photodetection

by Jianbin Zhang, Linfan Duan, Nan Zhou, Lihui Zhang, Conghui Shang, Hua Xu, Rusen Yang, Xiao Wang, Xiaobo Li
Modulating the Function of GeAs/ReS2 van der Waals Heterojunction with its Potential Application for Short-Wave Infrared and Polarization-Sensitive Photodetection

Multifunctional GeAs/ReS2 van der Waals (vdWs) heterojunction device is realized via modulating the doping level of GeAs. The directional rectification of the forward rectifying diode, Zener tunneling diode, and backward rectifying diodes is controlled by optimizing the effective band gap between GeAs and ReS2. This work provides an effective strategy to achieve multifunctional 2D vdW heterojunction devices.


Abstract

Van der Waals heterojunction (vdWs) of 2D materials with integrated or extended superior characteristics, opening up new opportunities in functional electronic and optoelectric device applications. Exploring methods to achieve multifunctional vdWs heterojunction devices is one of the most promising prospects in this area. Herein, a diverse function of forward rectifying diode, Zener tunneling diode, and backward rectifying diodes are realized in GeAs/ReS2 heterojunction by modulating the doping level of GeAs. The tunneling diode presents an interesting trend forward negative differential resistance (NDR) behavior which may facilitate the application of multi-value logic. More importantly, the GeAs/ReS2 forward rectifying diode exhibits highly sensitive photodetection in the wide-spectrum range up to 1550 nm corresponding to a short-wave infrared (SWIR) region. In addition, as two strong anisotropic 2D materials of GeAs and ReS2, the heterojunction exhibits strong polarization-sensitive photodetection behavior with a dichroic photocurrent ratio of 1.7. This work provides an effective strategy to achieve multifunctional 2D vdW heterojunction devices and develops more possibilities to broaden their functionalities and applications.

09 May 05:19

[ASAP] Intermediate State between MoSe2 and Janus MoSeS during Atomic Substitution Process

by Hiroo Suzuki, Yijun Liu, Masaaki Misawa, Chiyu Nakano, Yingzhe Wang, Ryo Nakano, Kentaro Ishimura, Kenji Tsuruta, and Yasuhiko Hayashi

TOC Graphic

Nano Letters
DOI: 10.1021/acs.nanolett.3c00972
09 May 05:19

Graphene metasurface hits the point

by Jiazheng Qin

Light: Science & Applications, Published online: 08 May 2023; doi:10.1038/s41377-023-01159-6

Graphene metasurface hits the point
09 May 05:13

Collective Control of Potential‐Constrained Oxygen Vacancies in Oxide Heterostructures for Gradual Resistive Switching

by Jaeyoung Jeon, Kitae Eom, Minkyung Lee, Sungkyu Kim, Hyungwoo Lee
Collective Control of Potential-Constrained Oxygen Vacancies in Oxide Heterostructures for Gradual Resistive Switching

A collective control of oxygen vacancies is proposed to implement reliable and gradual resistive switching in ultrathin LaAlO3/SrTiO3 (LAO/STO) heterostructures. By controlling the concentration of the potential-constrained surface oxygen vacancies, the filament-free LAO/STO device shows the analog resistive switching property with a high accuracy of over 91% which is beneficial for neuromorphic applications.


Abstract

Filamentary resistive switching in oxides is one of the key strategies for developing next-generation non-volatile memory devices. However, despite numerous advantages, their practical applications in neuromorphic computing are still limited due to non-uniform and indeterministic switching behavior. Given the inherent stochasticity of point defect migration, the pursuit of reliable switching likely demands an innovative approach. Herein, a collective control of oxygen vacancies is introduced in LaAlO3/SrTiO3 (LAO/STO) heterostructures to achieve reliable and gradual resistive switching. By exploiting an electrostatic potential constraint in ultrathin LAO/STO heterostructures, the formation of conducting filaments is suppressed, but instead precisely control the concentration of oxygen vacancies. Since the conductance of the LAO/STO device is governed by the ensemble concentration of oxygen vacancies, not their individual probabilistic migrations, the resistive switching is more uniform and deterministic compared to conventional filamentary devices. It provides direct evidence for the collective control of oxygen vacancies by spectral noise analysis and modeling by Monte-Carlo simulation. As a proof of concept, the significantly-improved analog switching performance of the filament-free LAO/STO devices is demonstrated, revealing potential for neuromorphic applications. The results establish an approach to store information by point defect concentration, akin to biological ionic channels, for enhancing switching characteristics of oxide materials.

09 May 05:13

Giant Magnetocaloric Effect in Magnets Down to the Monolayer Limit

by Weiwei He, Yan Yin, Qihua Gong, Richard F. L. Evans, Oliver Gutfleisch, Bai‐Xiang Xu, Min Yi, Wanlin Guo
Giant Magnetocaloric Effect in Magnets Down to the Monolayer Limit

The existence of giant magnetocaloric effect (MCE) and its strain tunability in monolayer magnets such as CrX3 (X = F, Cl, Br, I), CrAX (A = O, S, Se; X = F, Cl, Br, I), and Fe3GeTe2 are revealed through multiscale calculations. MCE of 2D magnets is theoretically comparable to that of bulk materials and can be remarkably tuned by strain. In particular, CrF3 possesses the state-of-the-art MCE at low temperatures. These findings advocate the giant-MCE monolayer magnets, opening new opportunities for magnetic cooling at nanoscale.


Abstract

2D magnets can potentially revolutionize information technology, but their potential application to cooling technology and magnetocaloric effect (MCE) in a material down to the monolayer limit remain unexplored. Herein, it is revealed through multiscale calculations the existence of giant MCE and its strain tunability in monolayer magnets such as CrX3 (X = F, Cl, Br, I), CrAX (A = O, S, Se; X = F, Cl, Br, I), and Fe3GeTe2. The maximum adiabatic temperature change (ΔTadmax$\Delta T_{{\rm{ad}}}^{\max }$), maximum isothermal magnetic entropy change, and specific cooling power in monolayer CrF3 are found as high as 11 K, 35 µJ m−2 K−1, and 3.5 nW cm−2 under a magnetic field of 5 T, respectively. A 2% biaxial and 5% a-axis uniaxial compressive strain can remarkably increase ΔTadmax$\Delta T_{{\rm{ad}}}^{\max }$ of CrCl3 and CrOF by 230% and 37% (up to 15.3 and 6.0 K), respectively. It is found that large net magnetic moment per unit area favors improved MCE. These findings advocate the giant-MCE monolayer magnets, opening new opportunities for magnetic cooling at nanoscale.

09 May 05:12

[ASAP] Periodic Ferroelectric Stripe Domains in α‑In2Se3 Nanoflakes Grown via Reverse-Flow Chemical Vapor Deposition

by Suyuan Zhou, Luocheng Liao, Jiahao Chen, Yayun Yu, Zhiquan Lv, Ming Yang, Bowen Yao, Sen Zhang, Gang Peng, Zongyu Huang, Yunya Liu, Xiang Qi, and Guang Wang

TOC Graphic

ACS Applied Materials & Interfaces
DOI: 10.1021/acsami.3c01886
09 May 05:10

Leaky-wave metasurfaces for integrated photonics

by Heqing Huang

Nature Nanotechnology, Published online: 08 May 2023; doi:10.1038/s41565-023-01360-z

Based on symmetry-breaking perturbations, leaky-wave metasurfaces with pointwise control of the amplitude, phase and polarization of surface emission offer a universal generalization of grating couplers for integrated photonics.
09 May 05:10

Parallel in-memory wireless computing

by Cong Wang

Nature Electronics, Published online: 08 May 2023; doi:10.1038/s41928-023-00965-5

A parallel in-memory wireless computing scheme that is based on memristive crossbar arrays can provide energy-efficient wireless data transmission using radio, acoustic and light waves.
09 May 05:01

[ASAP] Thickness Mapping and Layer Number Identification of Exfoliated van der Waals Materials by Fourier Imaging Micro-Ellipsometry

by Ralfy Kenaz, Saptarshi Ghosh, Pradheesh Ramachandran, Kenji Watanabe, Takashi Taniguchi, Hadar Steinberg, and Ronen Rapaport

TOC Graphic

ACS Nano
DOI: 10.1021/acsnano.2c12773
09 May 05:01

[ASAP] Micropatterning of Quantum Dots for Biofunctionalization and Nanoimaging

by Paul Robineau, Jérémie Béal, Thomas Pons, Rodolphe Jaffiol, and Cyrille Vézy

TOC Graphic

ACS Applied Nano Materials
DOI: 10.1021/acsanm.3c00778
09 May 05:00

[ASAP] Rational Strategy for Space-Confined Atomic Layer Deposition

by Ryoma Kamei, Takuro Hosomi, Masaki Kanai, Eisuke Kanao, Jiangyang Liu, Tsunaki Takahashi, Wenjun Li, Wataru Tanaka, Kazuki Nagashima, Katsuya Nakano, Koji Otsuka, Takuya Kubo, and Takeshi Yanagida

TOC Graphic

ACS Applied Materials & Interfaces
DOI: 10.1021/acsami.3c01443
09 May 04:59

[ASAP] Nano t‑Se Peninsulas Embedded in Natively Oxidized 2D TiSe2 Enable Uniform and Fast Memristive Switching

by Changying Xiong, Zhe Yang, Jiahao Shen, Feiyu Tang, Qiang He, Yi Li, Ming Xu, and Xiangshui Miao

TOC Graphic

ACS Applied Materials & Interfaces
DOI: 10.1021/acsami.3c00818
08 May 08:03

Giant enhancement of second-harmonic generation of indium selenide on planar Au

Nanoscale, 2023, 15,10125-10132
DOI: 10.1039/D3NR00526G, Paper
Yuxuan Ke, Chun Li, Yin Liang, Xi Zhang, Jiepeng Song, Ruijie Li, Lei Liu, Junfeng Dai, Zhongming Wei, Qing Zhang
In this work, we provide a facile two-dimensional hybrid structure consisting of a InSe flake on gold film, exhibiting great second-harmonic generation enhancement by over two orders of magnitude in a wide spectral range from 380 to 425 nm.
The content of this RSS Feed (c) The Royal Society of Chemistry
08 May 08:02

High‐Pressure Induction and Quantitative Regulation of Oxygen Vacancy Defects in Lithium Titanate

by Lv Yan, Jieming Qin, Benkuan Liang, Qi Wang, Mingchen Geng
High-Pressure Induction and Quantitative Regulation of Oxygen Vacancy Defects in Lithium Titanate

High-pressure induced and quantitatively regulated oxygen vacancies compensate for the limitations of lithium titanate conductivity and kinetics. In addition, the self-high-pressure quenching strategy produces abundant grain boundaries, interfaces, and vacancies, causing pseudo-capacitance effect to increase the capacity. Furthermore, the fracture structures are used as a storage of electrolyte to facilitate ion diffusion kinetics, thus improving the electrochemical performance.


Abstract

Inspired by the functional properties of ion defect induction and charge compensation in defect engineering, these methods are expected to be an effective strategy to solve the constraints of Li4Ti5O12 (LTO) inherent conductivity and diffusion dynamics, and further improve battery rate performance. The oxygen vacancy (OV) content in LTO can be controlled quantitatively by high-pressure induction using the high-pressure and high-temperature (HPHT) method. In addition, the relationship between the electrochemical properties and OV is further explored. The theoretical calculations indicate that the OV defects cause the electrons to delocalize into the conduction band of the LTO, and thus fundamentally improve the intrinsic conductivity. In particular, the high-pressure quenching strategy of HPHT causes LTO to instantly produce crack holes with massive crystalline layers, which can be regarded as storage for the electrolyte to facilitate ion diffusion. The fabricated LTO anodes containing OVs compensate for the limitation of the poor rate performance with a capacity of 176 mAh g−1 at 20 C. Pressure-induced OV defects not only open up a new perspective in the field of lithium-ion batteries (LIBs), but also provide a certain degree of freedom for the functional design characteristics of defect engineering.

08 May 04:09

Engineering Route for Stretchable, 3D Microarchitectures of Wide Bandgap Semiconductors for Biomedical Applications

by Thanh‐An Truong, Tuan Khoa Nguyen, Xinghao Huang, Aditya Ashok, Sharda Yadav, Yoonseok Park, Mai Thanh Thai, Nhat‐Khuong Nguyen, Hedieh Fallahi, Shuhua Peng, Sima Dimitrijev, Yi‐Chin Toh, Yusuke Yamauchi, Chun Hui Wang, Nigel Hamilton Lovell, John Ashley Rogers, Thanh Nho Do, Nam‐Trung Nguyen, Hangbo Zhao, Hoang‐Phuong Phan
Engineering Route for Stretchable, 3D Microarchitectures of Wide Bandgap Semiconductors for Biomedical Applications

Taking advantage of the optical transparency in wide bandgap semiconductors, this study introduces a unique engineering approach to develop flexible, 3D electronics which are fabricated on the front and back sides of free-standing nanomembranes. These 3D wide bandgap electronic platforms hold promise for organ-on-chip and long-term implanted applications.


Abstract

Wide bandgap (WBG) semiconductors have attracted significant research interest for the development of a broad range of flexible electronic applications, including wearable sensors, soft logical circuits, and long-term implanted neuromodulators. Conventionally, these materials are grown on standard silicon substrates, and then transferred onto soft polymers using mechanical stamping processes. This technique can retain the excellent electrical properties of wide bandgap materials after transfer and enables flexibility; however, most devices are constrained by 2D configurations that exhibit limited mechanical stretchability and morphologies compared with 3D biological systems. Herein, a stamping-free micromachining process is presented to realize, for the first time, 3D flexible and stretchable wide bandgap electronics. The approach applies photolithography on both sides of free-standing nanomembranes, which enables the formation of flexible architectures directly on standard silicon wafers to tailor the optical transparency and mechanical properties of the material. Subsequent detachment of the flexible devices from the support substrate and controlled mechanical buckling transforms the 2D precursors of wide band gap semiconductors into complex 3D mesoscale structures. The ability to fabricate wide band gap materials with 3D architectures that offer device-level stretchability combined with their multi-modal sensing capability will greatly facilitate the establishment of advanced 3D bio-electronics interfaces.

08 May 04:05

Modulation of Contact Resistance of Dual‐Gated MoS2 FETs Using Fermi‐Level Pinning‐Free Antimony Semi‐Metal Contacts

by Tien Dat Ngo, Tuyen Huynh, Hanggyo Jung, Fida Ali, Jongwook Jeon, Min Sup Choi, Won Jong Yoo
Modulation of Contact Resistance of Dual-Gated MoS2 FETs Using Fermi-Level Pinning-Free Antimony Semi-Metal Contacts

Dual-gated MoS2 field-effect transistors are fabricated using semimetal (antimony, Sb) as top surface electrodes and hexagonal boron nitride as a top-gate (TG) dielectric. This approach achieves Fermi level pinning (FLP)-free contacts, which enable a strong modulation of pseudo-junction resistance by TG voltages, owing to the weak FLP.


Abstract

Achieving low contact resistance (R C) is one of the major challenges in producing 2D FETs for future CMOS technology applications. In this work, the electrical characteristics for semimetal (Sb) and normal metal (Ti) contacted MoS2 devices are systematically analyzed as a function of top and bottom gate-voltages (V TG and V BG). The semimetal contacts not only significantly reduce R C but also induce a strong dependence of R C on V TG, in sharp contrast to Ti contacts that only modulate R C by varying V BG. The anomalous behavior is attributed to the strongly modulated pseudo-junction resistance (R jun) by V TG, resulting from weak Fermi level pinning (FLP) of Sb contacts. In contrast, the resistances under both metallic contacts remain unchanged by V TG as metal screens the electric field from the applied V TG. Technology computer aided design simulations further confirm the contribution of V TG to R jun, which improves overall R C of Sb-contacted MoS2 devices. Consequently, the Sb contact has a distinctive merit in dual-gated (DG) device structure, as it greatly reduces R C and enables effective gate control by both V BG and V TG. The results offer new insight into the development of DG 2D FETs with enhanced contact properties realized by using semimetals.

08 May 04:02

Dual Coil Patterned Ultra‐Thin Silicon Film Enable by Double‐Sided Process

by ChangHee Son, Sangyeop Lee, Placid M. Ferreira, Seok Kim
Dual Coil Patterned Ultra-Thin Silicon Film Enable by Double-Sided Process

Double-sided processing on ultra-thin silicon provides the opportunity to double the number of devices or create dual functionalities. As a demonstration, a dual coil patterned ultra-thin silicon (DCUTS) is fabricated. DCUTS is then demonstrated as an actuating, energy harvesting, and vibrating mirror system. A multiphysics simulation model is also developed, and the reliability of the device is tested.


Abstract

Double-sided microfabrication process on an ultra-thin silicon film has rarely been attempted due to the challenges in terms of the preparation and handling of a thin film in spite of its promising fabrication potentials. Such a process allows for doubling the thin film device density or providing dual functionalities for a thin film depending on whether the front and back sides of a thin film are processed identically or distinctively. Here, a novel double-sided thin film processing strategy is introduced by realizing a dual coil patterned ultra-thin silicon film that is working as an actuating or energy harvesting system. Experimentally, a dual coil patterned thin film enabled using the introduced approach shows remarkably enhanced device performance when compared with a single coil patterned counterpart. Furthermore, a multiphysics simulation model is developed and the resultant modeling data validate the experimentally measured performance enhancement. Finally, the structural durability of the thin film upon cyclic loading is tested and its diverse vibration modes are investigated.

08 May 04:01

Writing‐Speed Dependent Thresholds of Ferroelectric Domain Switching in Monolayer α‐In2Se3

by Weijie Yang, Bo Cheng, Jianhua Hou, Junkai Deng, Xiangdong Ding, Jun Sun, Jefferson Zhe Liu
Writing-Speed Dependent Thresholds of Ferroelectric Domain Switching in Monolayer α-In2Se3

The ferroelectric domain of monolayer α-In2Se3 can be switched by applying mechanical loading or electrical biasing using the tip of piezoresponse force microscopy. The threshold forces (Fc) and voltages (Ec) for domain switching increase with the increasing writing-domain speeds, indicating a speed-dependent effect on ferroelectric domain switching.


Abstract

An electrical-biased or mechanical-loaded scanning probe written on the ferroelectric surface can generate programmable domain nanopatterns for ultra-scaled and reconfigurable nanoscale electronics. Fabricating ferroelectric domain patterns by direct-writing as quickly as possible is highly desirable for high response rate devices. Using monolayer α-In2Se3 ferroelectric with ≈1.2 nm thickness and intrinsic out-of-plane polarization as an example, a writing-speed dependent effect on ferroelectric domain switching is discovered. The results indicate that the threshold voltages and threshold forces for domain switching can be increased from −4.2 to −5 V and from 365 to 1216 nN, respectively, as the writing-speed increases from 2.2 to 10.6 µm s−1. The writing-speed dependent threshold voltages can be attributed to the nucleations of reoriented ferroelectric domains, in which sufficient time is needed for subsequent domain growth. The writing-speed dependent threshold forces can be attributed to the flexoelectric effect. Furthermore, the electrical-mechanical coupling can be employed to decrease the threshold force, achieving as low as ≈189±41 nN, a value smaller than those of perovskite ferroelectric films. Such findings reveal a critical issue of ferroelectric domain pattern engineering that should be carefully addressed for programmable direct-writing electronics applications.

08 May 03:57

Chemical vapor deposition synthesis and Raman scattering investigation of quasi-one-dimensional ZrS3 nanoflakes

Abstract

Quasi-one-dimensional ZrS3 nanoflakes attract intense interest attributed to their superior electrical and optical anisotropy, stemming from the low symmetry in the crystal structure. However, the conventional chemical vapor transport method for synthesizing bulk ZrS3 is limited by morphology and size controllability. It is highly desirable to propose a facile way to precisely synthesize ZrS3 nanoflakes. In this work, the chemical vapor deposition method is proposed as a feasible way to synthesize ZrS3 nanoflakes. The effects of various substrates and temperatures on ZrS3 synthesis have been investigated. For the as-grown ZrS3, good crystallinity is confirmed with X-ray diffraction and transmission electron microscopy. The structure and interlayer coupling are investigated with Raman scattering spectroscopy. The strong in-plane anisotropy and interlayer coupling of the ZrS3 nanoflakes are illustrated with angle-resolved Raman spectroscopy and temperature-dependent Raman characterization, respectively. This study demonstrates a feasible way for the synthesis of transition metal trisulfides, which may shed new light on the research of other two-dimensional anisotropic transition metal materials.

08 May 03:57

A generalized synthesis method for freestanding multiferroic two-dimensional layered supercell oxide films via a sacrificial buffer layer

Abstract

Multiferroics are an intriguing family of materials due to the simultaneous presence of two ferroic orderings, namely, ferroelectricity and ferromagnetism. They are scientifically and technologically important and have numerous potential applications, such as four-state logic memories and multiferroic tunneling junctions. However, the growth of epitaxial single-phase multiferroic thin films typically requires single crystalline oxide substrates, which hinders their future integration with Si-based devices. In this study, we report a generalized synthesis method that uses the polydimethylsiloxane (PDMS)-assisted wet-etching method with an Sr3Al2O6 (SAO) sacrificial layer to transfer freestanding single-phase multiferroic Bi2NiMnO6 (BNMO) films from conventional SrTiO3 (STO) substrates onto a Si wafer. The structures and properties of the films have been characterized before and after the transfer. These transferred films possess good multiferroic properties on Si wafers, indicating full compatibility with modern Si technology. This method can be generally applicable to other Bi-based multiferroic materials as well. Lastly, the original STO substrates after the transfer process have been recycled for preparing new batches of freestanding BNMO films, indicating a low-cost and sustainable method for manufacturing large-volume freestanding complex oxide thin films.

08 May 03:53

Bendable Silicene Membranes

by Christian Martella, Chiara Massetti, Daya Sagar Dhungana, Emiliano Bonera, Carlo Grazianetti, Alessandro Molle
Bendable Silicene Membranes

The introduction of 2D silicene into bendable membranes allows investigating its optothermal and piezoresistive properties when external strain is applied on a micro and macroscale, thus representing an advance toward a new generation of flexible and fully silicon-based devices.


Abstract

Due to their superior mechanical properties, 2D materials have gained interest as active layers in flexible devices co-integrating electronic, photonic, and straintronic functions altogether. To this end, 2D bendable membranes compatible with the technological process standards and endowed with large-scale uniformity are highly desired. Here, it is reported on the realization of bendable membranes based on silicene layers (the 2D form of silicon) by means of a process in which the layers are fully detached from the native substrate and transferred onto arbitrary flexible substrates. The application of macroscopic mechanical deformations induces a strain-responsive behavior in the Raman spectrum of silicene. It is also shown that the membranes under elastic tension relaxation are prone to form microscale wrinkles displaying a local generation of strain in the silicene layer consistent with that observed under macroscopic mechanical deformation. Optothermal Raman spectroscopy measurements reveal a curvature-dependent heat dispersion in silicene wrinkles. Finally, as compelling evidence of the technological potential of the silicene membranes, it is demonstrated that they can be readily introduced into a lithographic process flow resulting in the definition of flexible device-ready architectures, a piezoresistor, and thus paving the way to a viable advance in a fully silicon-compatible technology framework.

08 May 03:51

Shift‐Current Photovoltaics Based on a Non‐Centrosymmetric Phase in In‐Plane Ferroelectric SnS

by Yih‐Ren Chang, Ryo Nanae, Satsuki Kitamura, Tomonori Nishimura, Haonan Wang, Yubei Xiang, Keisuke Shinokita, Kazunari Matsuda, Takashi Taniguchi, Kenji Watanabe, Kosuke Nagashio
Shift-Current Photovoltaics Based on a Non-Centrosymmetric Phase in In-Plane Ferroelectric SnS

A non-centrosymmetric layer stacking phase of 2D tin sulfide (SnS) is successfully achieved on van der Waals substrates and the shift current in SnS is demonstrated. Following the PFM observation that reveals the existence of ferroelectric domains, an atomic model of the ferroelectric domain boundary is proposed.


Abstract

The shift-current photovoltaics of group-IV monochalcogenides has been predicted to be comparable to those of state-of-the-art Si-based solar cells. However, its exploration has been prevented from the centrosymmetric layer stacking in the thermodynamically stable bulk crystal. Herein, the non-centrosymmetric layer stacking of tin sulfide (SnS) is stabilized in the bottom regions of SnS crystals grown on a van der Waals substrate by physical vapor deposition and the shift current of SnS, by combining the polarization angle dependence and circular photogalvanic effect, is demonstrated. Furthermore, 180° ferroelectric domains in SnS are verified through both piezoresponse force microscopy and shift-current mapping techniques. Based on these results, an atomic model of the ferroelectric domain boundary is proposed. The direct observation of shift current and ferroelectric domains reported herein paves a new path for future studies on shift-current photovoltaics.